Influence of silicon wafer surface roughness on semiconductor device characteristics
نویسندگان
چکیده
منابع مشابه
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Silicon is an ideal material for spintronic applications [1] due to long spin lifetime, however, considerable spin relaxation in gated silicon structures was experimentally observed [2]. Surface roughness scattering determines the transport in the channel at high carrier concentration in thin silicon films [3]. Here we investigate the spin relaxation due to surface roughness. The surface roughn...
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ژورنال
عنوان ژورنال: Japanese Journal of Applied Physics
سال: 2020
ISSN: 0021-4922,1347-4065
DOI: 10.35848/1347-4065/ab918c